ion beam sputtering
基本解释
- 離子束濺射;離子束濺鍍法
英汉例句
- WO_3 thin films prepared by Reactive Ion Beam Sputtering are amorphous at RT substrate temperature.
本文利用反應離子束濺射技術制備WO_3薄膜,在襯底溫度爲室溫時,濺射制備的薄膜經電子束(?) - Ion beam sputtering deposited Ni was used as etching mask. The measured etching rates increased with the increasing ICP dc bias.
採用離子束濺射生長的N i作爲刻蝕掩模,刻蝕速率隨ICP直流偏壓的增加而增加。 - The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
濺射特性研究結果表明:屏極電壓和濺射氣壓對離子束均勻性和束流密度影響顯著;
雙語例句
词组短语
- ion n beam sputtering 離子束濺射
- reactive ion -beam sputtering 反應離子束濺射
- ion -beam sputtering technique 離子束濺射技術
- ion beam sputtering system 離子束濺鍍系統;離子束微影術
- ion beam sputtering method 離子束濺射法
短語
专业释义
- 離子束沉積
- 離子束濺射
- 離子束濺射