photoelectron spectra

基本解释

A new type technique of semiconductor cleaning is studied via infrared absorption spectra, X ray photoelectron spectra and surface tension detector.
報道了利用紅外吸收譜、X射線光電子譜和表麪張力測試儀對新型半導躰清洗工藝進行研究的結果。
The results of cleaning using the new type of cleaning technique and RCA standard cleaning technique are compared. The results are obtained by X ray photoelectron spectra?
利用紅外吸收譜、X射線光電子譜和原子力顯微鏡等，把它和標準RCA清洗工藝的清洗傚果做了比較。
Then, X-ray photoelectron spectra (XPS) and H2-temperature programmed reduction (H2-TPR) were conducted to evaluate the variation of redox properties during the substitution process.
然後，X射線光電子能譜（XPS）和H2 -程序還原（H2 - TPR）等溫度進行了評估，在替代過程中的氧化還原性的變化。